Chinese Journal of Catalysis ›› 2026, Vol. 87: 363-375.DOI: 10.1016/S1872-2067(26)65063-2
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Zhongchen Maa, Meiyi Yina, Run Xub, Rongjun Zhangb, Tian Lana, Wenli Gua, Guoqing Chena, Yong Lua,c,*(
)
Received:2025-11-19
Accepted:2025-12-22
Online:2026-08-18
Published:2026-06-24
Supported by:Zhongchen Ma, Meiyi Yin, Run Xu, Rongjun Zhang, Tian Lan, Wenli Gu, Guoqing Chen, Yong Lu. Coking-resistant CeAlO3-Socketed Nickel Nanocatalysts for dry reforming of methane[J]. Chinese Journal of Catalysis, 2026, 87: 363-375.
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URL: https://www.cjcatal.com/EN/10.1016/S1872-2067(26)65063-2
Fig. 1. Reduction induced Ni exsolution from Ce1Al0.95Ni0.05Ox composite oxide. (a) XRD patterns and local enlarged patterns of Ce1Al0.95Ni0.05Ox and Ce1Al0.95Ni0.05Ox-T catalysts (T, reduction temperature). (b) Crystallite sizes of CeAlO3 in the Ce1Al0.95Ni0.05Ox-T catalysts, derived from XRD patterns. (c) TEM images of representative Ce1Al0.95Ni0.05Ox-T catalysts. (d) Schematic illustration of the exsolution degree of nickel nanoparticles against reduction temperatures, based on TEM images. (e) SEM images of the Ce1Al0.95Ni0.05Ox-T catalysts.
Fig. 2. Structural characterization of exsolved Ni nanoparticles. (a) XRD patterns and local enlarged patterns of fresh and reduced catalysts. (b) H2 pulse chemisorption-MS profiles of the Ce1Al0.95Ni0.05Ox-750 and Ni/CeAlO3-750 catalysts. (c) TEM image of the Ni/CeAlO3-750 catalyst. (d) AC-STEM image of the Ce1Al0.95Ni0.05Ox-750 catalyst and EDS line mapping images (inset) across the region outlined by red dashed line. (e) Ball-and-stick model of the Ni-CeAlO3 interface. (f) Schematic illustration of the particle-substrate interface for deposited and exsolved Ni nanoparticles.
Fig. 3. Catalytic performance of Ce1Al0.95Ni0.05Ox-T and Ni/CeAlO3-750 catalysts for the DRM reaction and characterization of the used catalysts. (a) CH4 and CO2 conversions during 100-h DRM reaction test. XRD patterns and local enlarged patterns (b), TG profiles (c), and O2-TPO-MS profiles (d) of the used catalysts. (e) 500-h DRM reaction stability test of the Ce1Al0.95Ni0.05Ox-750 catalyst. Reaction conditions: 700 °C, CH4/CO2 = 1/1, GHSV = 15 L gcat−1 h−1, and 1 bar.
Fig. 4. Insights into CH4 and CO2 activations at the Ni-CeAlO3 interface. CH4-TPSR-MS (a), CO2-TPSR-MS (b), and CO2/CH4-TPSR-MS (c) profiles for the Ce1Al0.95Ni0.05Ox-750 and Ni/CeAlO3-750 catalysts.
Fig. 5. Interfacial catalysis for DRM reaction. (a) 13CO2/CH4-TPSR-MS profiles for Ce1Al0.95Ni0.05Ox-750 in a flow of 13CO2/CH4/He (1/1/8) at 30 mL min−1. (b) 13CO2/CH4-constant temperature pulse reaction over Ni/CeAlO3-750 and Ce1Al0.95Ni0.05Ox-750 catalysts at 750 °C, with each pulse of 0.5 mL of 13CO2/CH4/He (1/1/8) carried by He at 20 mL min−1. In-situ DRIFT spectra collected over Ce1Al0.95Ni0.05Ox-750 catalyst under static-state CO2/CH4/He (1/1/8) atmosphere at 700 °C (c,d), and under continuous CO2/He (1/9) flow at 20 mL min−1 first for 15 min at 700 °C followed by He purging for 15 min, and then exposed to continuous flow of CH4/He (1/9) at 20 mL min−1 for another 15 min at 700 °C (e,f).
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