Use of NiO/SiO2 catalysts for toluene total oxidation: Catalytic reaction at lower temperatures and repeated regeneration

doi:10.1016/S1872-2067(16)62514-7

Abstract

Abstract:

We deposited NiO via atomic layer deposition on mesoporous SiO₂ particles with diameters of sev-eral hundred micrometers and a mean mesopore size of ~14 nm. NiO was deposited within the shell region of mesoporous SiO₂ particles with a shell thickness of ~11 mm. We annealed the as-prepared NiO/SiO₂ at 450 and 600℃, respectively. These two samples were used as catalysts for the uptake of toluene molecules and their oxidative conversion to CO₂. The sample annealed at 450℃ was generally more reactive in toluene uptake and its subsequent conversion to CO₂. When the NiO/SiO₂ annealed at 450℃ was exposed to toluene vapor at 160℃ and then heated to 450℃, CO₂ was emitted with almost no toluene desorption. We suggest that our catalysts can be used as building blocks for odor removal devices that operate below 200℃. These catalysts can be regularly regenerated at ~450℃.

Key words: Heterogeneous catalysis, Chemisorption, Thermal desorption, Mesoporous material, Toluene oxidation

Sang Wook Han, Myung-Geun Jeong, Il Hee Kim, Hyun Ook Seo, Young Dok Kim. Use of NiO/SiO₂ catalysts for toluene total oxidation: Catalytic reaction at lower temperatures and repeated regeneration[J]. Chinese Journal of Catalysis, 2016, 37(11): 1931-1940.

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URL: https://www.cjcatal.com/EN/10.1016/S1872-2067(16)62514-7

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Use of NiO/SiO₂ catalysts for toluene total oxidation: Catalytic reaction at lower temperatures and repeated regeneration

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