催化学报 ›› 2009, Vol. 30 ›› Issue (6): 503-508.

• 研究论文 • 上一篇    下一篇

化学气相沉积三甲基氯硅烷制备两亲性HZSM-5沸石

蒋平,马丽,潘剑,淳远,须沁华,董家騄   

  1. 南京大学化学化工学院介观化学教育部重点实验室, 江苏南京 210093
  • 收稿日期:2009-06-25 出版日期:2009-06-25 发布日期:2013-03-22

Preparation of Amphiphilic HZSM-5 Zeolite by Chemical Vapor Deposition of Trimethylchlorosilane

JIANG Ping, MA Li, PAN Jian, CHUN Yuan*, XU Qinhua, DONG Jialu   

  1. Key Laboratory of Mesoscopic Chemistry of Ministry of Education, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, Jiangsu, China
  • Received:2009-06-25 Online:2009-06-25 Published:2013-03-22

摘要: 以三甲基氯硅烷 ((CH3)3SiCl)为改性剂, 采用化学气相沉积法对 HZSM-5 沸石外表面进行修饰, 再通过控制后处理抽空温度, 制得两亲性沸石样品. 在沉积过程中, 改性剂与沸石外表面末端硅羟基作用形成亲油性基团, 使得样品主要呈现出亲油性; 经 423~523 K 抽空处理后, 沉积的 (CH3)3Si 基团发生 Si–C 键断裂而脱附出 1~2 个甲基, 样品表现出两亲性能. 该改性过程对 HZSM-5 沸石的孔道大小和内表面性质影响很小. 在乙酸异戊酯相界面催化水解反应中, 该两亲性沸石分布于水/油两相界面, 表现出明显高于亲水性母体 HZSM-5 沸石的催化活性.

关键词: 三甲基氯硅烷, HZSM-5, 两亲性沸石, 化学气相沉积, 相界面催化

Abstract: Amphiphilic HZSM-5 zeolite particles were prepared by the chemical vapor deposition of (CH3)3SiCl on the external surface of HZSM-5 zeolite followed by post-evacuation at 423–523 K to remove excessive hydrophobic CH3 groups. With a similar internal surface property and pore size to the parent zeolite, they exhibited obviously superior catalytic performance in the hydrolysis of isoamyl acetate.

Key words: trimethylchlorosilane, HZSM-5, amphiphilic zeolite, chemical vapor deposition, phase-boundary catalysis