催化学报 ›› 2017, Vol. 38 ›› Issue (9): 1508-1514.DOI: 10.1016/S1872-2067(17)62903-6

• 小综述 • 上一篇    下一篇

原子层沉积技术制备单原子催化剂

Niancai Chenga,b, Xueliang(Andy) Suna   

  1. a 西安大略大学机械材料工程系, 加拿大;
    b 福州大学材料科学与工程学院, 福建福州 350108, 中国
  • 收稿日期:2017-07-06 修回日期:2017-08-14 出版日期:2017-09-18 发布日期:2017-09-06
  • 通讯作者: Xueliang(Andy) Sun

Single atom catalyst by atomic layer deposition technique

Niancai Chenga,b, Xueliang(Andy) Suna   

  1. a Department of Mechanical and Materials Engineering, University of Western Ontario, London, ON N6A 5B9, Canada;
    b College of Materials Science and Engineering, Fuzhou University, Fuzhou 350108, Fujian, China
  • Received:2017-07-06 Revised:2017-08-14 Online:2017-09-18 Published:2017-09-06
  • Contact: 10.1016/S1872-2067(17)62903-6

摘要:

贵金属单原子催化剂因具有独特的催化性能和高的利用率而迅速引人关注.原子层沉积(ALD)逐渐成为大批量合成稳定单原子的有力工具.本文总结了采用ALD合成单原子的最新进展,以及未来的研究方向和趋势.

关键词: 单原子, 原子层沉积, 催化, 贵金属催化剂, 机理

Abstract:

Noble single-atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful tech-nique for large-scale synthesis of stable single atom. In this review, we summarize recent develop-ments of single atom synthesized by ALD as well as explore future research direction and trends.

Key words: Single-atom, Atomic layer deposition, Catalysis, Noble catalyst, Mechanism