Chinese Journal of Catalysis ›› 2026, Vol. 90: 243-252.DOI: 10.1016/S1872-2067(26)65202-3
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Linxiao Wua,1, Yumeng Hana,1, Jinshui Chenga, Yushuai Sangb, Xiang Chenc, Yaqing Zhangc, Xuewen Fuc,e, Jingshan Luoa,d,e,*(
)
Received:2026-02-06
Accepted:2026-03-19
Online:2026-11-05
Published:2026-09-09
About author:First author contact:1Contributed equally to this work.
L.W. and Y.H. contribute equally to this work. L.W. and J.L. conceived the idea and designed the experiment. L.W. conducted the device fabrication, characterization. Y.H. prepared the samples and tested the PEC performance. J.C. contributed to the discussion of the results. Y. S contributed to the polishing pretreatment. X.C., Y.Z. and X.F. collected PL and TRPL data. J.L. supervised the project. L.W. wrote the first draft, and J.L. finalized the manuscript. All authors contributed to the revision of the manuscript.
Supported by:Linxiao Wu, Yumeng Han, Jinshui Cheng, Yushuai Sang, Xiang Chen, Yaqing Zhang, Xuewen Fu, Jingshan Luo. Low-defect Cu2O films with vertical grains via tartaric acid assisted solution growth for efficient photoelectrochemical water splitting[J]. Chinese Journal of Catalysis, 2026, 90: 243-252.
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URL: https://www.cjcatal.com/EN/10.1016/S1872-2067(26)65202-3
Fig. 1. (a) XRD patterns of T-Cu2O electrodeposited from a tartrate stabilized copper sulfate solution and L-Cu2O film from a lactate-stabilized copper sulfate solution. Indexes were taken from the following patterns: Au PDF#99-0056, Cu2O PDF#05-0667, FTO PDF#41-1445. XPS spectra Cu 2p (b) and XPS O 1s spectra (c) of T-Cu2O film and L-Cu2O film. Top-view SEM images of T-Cu2O films with electrodeposition time of 1 min (d), 5 min (e), and 50 min (f). Top-view SEM images of L-Cu2O films with electrodeposition time of 1 min (g), 5 min (h), and 100 min (i).
Fig. 2. Cross-sectional SEM image (a), EBSD pattern-quality map (b), and EBSD orientation-distribution map (c) perpendicular to substrate highlighted by false colors within the related inverse pole figure of T-Cu2O film (electrodeposition time for 50 min). Cross-sectional SEM image (d), EBSD pattern-quality map (e), and EBSD orientation-distribution maps (f) perpendicular to substrate of L-Cu2O film (electrodeposition time for 200 min). (g,h) Schematic diagram of charge transport in Cu2O films.
Fig. 3. Mott-Schottky plots (a) and PL spectra (b) of T-Cu2O and L-Cu2O films. Streak camera images of TRPL of T-Cu2O (c) and L-Cu2O (d) films. (e,f) Corresponding decay traces of the near band emission extracted from (c) and (d) fitted using a biexponential function. C-AFM current mapping images of T-Cu2O (g) and L-Cu2O (h) films. CPD of T-Cu2O (i) and L-Cu2O (j) films.
Fig. 4. (a) J-V curve of T-Cu2O and L-Cu2O photocathodes (Cu2O/Ga2O3/ZnGeOx/TiO2/RuOx) under continuous simulated one-sun AM 1.5 G (solid line) and dark condition (dashed line). (b) J-V curve of T-Cu2O and L-Cu2O photoelectrodes under chopped simulated AM 1.5G illumination. Statistical current density at 0 V vs. RHE (c) and onset potential (d) of Cu2O photoelectrodes under continuous simulated one-sun air mass 1.5 G condition. (e) IPCE spectra under monochromatic illumination of T-Cu2O and L-Cu2O photoelectrodes at 0 V vs. RHE. (f) Stability test of T-Cu2O photocathode at 0.5 V vs. RHE. All measurements were performed in a pH 5.0 electrolyte solution under constant stirring at 500 rpm.
Fig. 5. SPVM images of T-Cu2O (a) and L-Cu2O (b) photoelectrodes (Cu2O/Ga2O3/ZnGeOx/TiO2). SPVM images of T-Cu2O (d) and L-Cu2O (e) photoelectrodes with RuOx catalyst (Cu2O/Ga2O3/ZnGeOx/TiO2/RuOx). The vertical height gradient denotes film surface topography, and the color gradient represents CPD. SPV spectra for T-Cu2O and L-Cu2O photoelectrodes without (c) and with (f) catalyst. Charge transfer efficiency (ηtransfer) (g) and charge separation efficiency (ηsep) (h) of Cu2O photocathodes. (i) The open-circuit potential of Cu2O/Ga2O3/ZnGeOx/TiO2/RuOx photocathodes under chopped illumination condition in pH 5 electrolyte.
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